Paper Publications
Repair of Oxygen Vacancies and Improvement of HfO2/MoS2 Interface by NH3-Plasma Treatment
Release time:2021-05-21 Hits:
Indexed by:Journal paper
Document Code:15
First Author:Xinyuan Zhao
Correspondence Author:Pui-To Lai,Lu Liu
Co-author:Wing-Man Tang.,Jingping Xu
Journal:IEEE Transactions on Electron Devices
Included Journals:SCI
Affiliation of Author(s):华中科技大学
Place of Publication:美国
Discipline:Engineering
First-Level Discipline:Electronic Science And Technology
Funded by:国家自然科学基金
Document Type:J
Volume:66
Issue:10
Page Number:4337-4342
Date of Publication:2019-10-05
Teaching and Research Group:光学与电子信息学院