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Characterization of optical materials = 光学材料的表征
发布日期:2014-09-18  浏览

[内容简介]

Characterization in Optica/ Materia/s provides information for understanding the properties and performance of optical materials under the influence of the various characterization techniques. Surface and interfacial properties are key to the optical response of a material, and their control and modification during materials processing is necessary to achieve desired behavior. Characterization of Optica/ Materia/s focuses on how surface morphology, microstructure, and chemical bonding influence the optical response of a material, and it illuminates methods used to characterize thin films, multilayer structures, and modified surfaces.
[目录]

PrefacetotheReissueoftheMaterialsCharacterizationSeries
PrefacetoSeries
PrefacetotheReissueofCharacterizationofOpticalMaterials
Preface
Contributors
INTRODUCTION

PART1INFLUENCEOFSURFACEMORPHOLOGYAND
MICROSTRUCTUREONOPTICALRESPONSE
CHARACTERIZATIONOFSURFACEROUGHNESS
1.1Introduction
1.2WhatSurfaceRoughnessls
1.3HowSurfaceRoughnessAffctsOpticaIMeasurements
1.4HowSurfaceRoughnessandScatteringAreMeasured
1.5CharacterizationofSelectedSurfaces
1.6FutureDifections

CHARACTERIZATIONOFTHENEAR-SURFACEREGIONUSINGPOIARIZATION-SENSITIVEOPTICALTECHNIQUES
2.1Introduction
2.2Ellipsometry
ExperimentallmplementationsofEllipsometry29,Analysisof
EllipsometryData
2.3MicrostructuralDeterminationsfromEllipsometryData
TemperatureDependenceoftheOpticatPropertiesofSilicon34,
DeterminationoftheOpticalFunctionsofGlassesUsingSE35,
SpectroscopicEllipsometryStudiesofSi02/Si37,Spectroscopic
EllipsometryforComplicatedFilmStrucrures38,Time-Resolved
Ellipsometry40,Single-WavelengthReal-TimeMonitoringofFilm
Growth41,Multiple-WavelengthReal-TimeMonitoringofFilm
Growth42,InfraredEllipsometryStudiesofFilmGrowth

THECOMPOSITION,STOICHIOMETRY,ANDRELATEDMICROSTRUCTUREOFOPTICALMATERIALS
3.1Introduction
3.2AspectsofRamanScattering
3.3III-VSemiconductorSystems
3.4GroupIVMaterials
3.5AmorphousandMicrocrystallineSemiconductors
ChalcogenideGlasses60,GroupIVMicrocrystallineSemiconductors
3.6Summary

DIAMONDASANOPTICALMATERIAL
4.1Introduction
4.2DepositionMethods
4.30pticalPropertiesofCVDDiamond
4.4DefectsinCVDDiamond
4.5PolishingCVDDiamond
4.6X-rayWindow
4.7Summary

PART2STABILITYANDMODIFICATIONOFFILMANDSURFACEOPTICALPROPERTIES
MULTIJAYEROPTICALCOATINGS
5.1Introduction
5.2Single-LayerOpticalCoatings
OpticaIConstants90,CompositionMeasurementTechniques
5.3MultilayerOpticalCoatings
CompositionaIAnalysis107,SurfaceAnalyticaITechniques108,
MicrostructuralAnalysisofMultilayerOpticalCoatings
5.4StabilityofMultilayerOpticalCoatings
5.5FutureCompositionaland
MicrostructuralAnalyticaITechniques

CHARACTERIZATIONANDCONTROLOFSTRESSINOPTICALFILMS
6.1Introduction
6.20riginsofStress
……

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